Behind the Mask

Spiva Center for the Arts invites artists to submit portrait work for a new exhibition exploring the tension between external appearances and internal truths.

Behind the Mask challenges the audience to examine how we navigate the complex relationship between our public selves and our private identities. Whether literal, metaphorical, or psychological, the “mask” serves as a symbol of the roles we adopt, the facades we construct, and the truth we conceal. These do not need to be self-portraits.

We invite entries of work in any physical medium. This will be a juried exhibition, and the work selected will be on display in Spiva’s gallery for seven weeks.

Applications are open until April 27, 2025. Submit your work here: https://bit.ly/behindthemask-spiva2025